Tool #433 Rapid Thermal Processor (RTP) AccuThermo AW610
The RTP AccuThermo AW610 is a PC controlled halogen lamp furnace. It accommodates 100mm wafers, or smaller wafers and pieces placed on a 100mm carrier wafer. This RTP is typically used for alloying of ohmic contacts on InP, GaN, and SiC. Not allowed for GaAs.
Specifications:
Process gas:
Ar or N2
Wafer size:
Up to 100mm
Max temperature:
1000°C
Max practical heating rate:
20°C/sec
Temperature sensor:
Pyrometer
Alowed substrates:
InP, Sapphire, SiC, Quatrz, Si