Mask aligner for UV photolithography - wavelenght: 400nm - mask size: 4 inch - material size: 3 inch.

UV-Intensity: 15 mW/cm2 , broadband emission constituting wavelengths 365mn(i-line) , 405nm(h-line), and 436nm(g-line).

Placement: Process lab 2

Funded by: Knut and Alice Wallenbergs foundation.

/John