Automatic developer tool for photolotpgraphy on wafers. Supported all sizes of wafers <= 6". Programmable arm (nozzle height, and radial positioning from the wafer center), spinning speed and direction, somewhat limited flow control (not precisly dispensing low volumes in reproducible manners), Back Side Rinsing, Stopping and Drying as part of the recipe, Hybrid recipes (combining all avalable developers), etc... No vacuum chuck.

Avalable developers: 

AZ351B:DIW 1:5 Spray Development

AZ Developer:DIW 1:1 Spray Development

AZ726MIF Puddle Development

Tested resists that can be developed: AZ1512, AZ4533, AZ4562, S1805, S1813, LOR3A/S1805, AZ1505