Picture of Furnace - Tempress LPCVD - Polysilicon
Current status:
AVAILABLE
Book | Log| 
Show/Collapse all

Responsibles
Files
You must be logged in to view files.
Description

Low pressure chemical vapour deposition of polysilicon or amorphous silicon from silane (SiH4).

 

Recipe Dep. rate (nm/min) Uniformity (%) n @ 633 nm Comment
         
a-Si-standard-550C-xxmin 2.0 1.5 4.55 amorphous Si
Poly-standard-610C-xxmin N/A N/A N/A poly-crystalline Si

 

Details
Tool name:
Furnace - Tempress LPCVD - Polysilicon
Area/room:
Processlab 1
Category:
Thermal processing
Manufacturer:
Tempress
Model:
TS6603RH-BM Series V
Tool rate:
C
Price/hour:
Low: 580 SEK
Medium: 1070 SEK
High: 1350 SEK
Instructors & Licensed Users

Instructors

Licensed Users

Tool Modes
You must be logged in to view tool modes.