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AVAILABLE
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OXFORD PlasmaPro 100 PECVD system

  • High quality PECVD of silicon nitride and silicon dioxide for photonics, dielectric layers, passivation and many other uses
  • High quality SiOx, SiNx and SiOxNy deposition for a wide range of applications

Up to 200mm diameter with carrier options available for multi-wafers or small pieces

Wafer stage temperature range: 220-350 C

Endpoint available to ensure optimum clean time

Tool name:
PECVD - Oxford
Area/room:
Processlab 1
Category:
Thin film deposition
Manufacturer:
Oxford Instruments
Model:
??
Tool rate:
C
Price/hour:
Low: 580 SEK
Medium: 1000 SEK
High: 1250 SEK

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