Picture of EBL - Raith EBPG 5200
Current status:
AVAILABLE
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High resolution electron beam lithography system.

Installed&accepted: 2016
Funded by: Wallenberg
Computer control: Red Hat Enterprise Linux
Control software: Raith BEAMS
Workpiece size: Chips >3-35mm, 2, 3, 4, 5, 6 and 8 inch wafers, 4, 5 and 6 inch masks
Materials allowed: Any vacuum compatible
Autoloader capacity: 10 cassettes
Acceleration voltage: 100kV
Electron source: Shottky TFE
Spotsize: 2nm - 150nm
Max scanning speed: 125MHz
Min beam step: 80pm
Field size: 1mm (max)
Stitching error 20nm@1mm writing field
Overlay error: 25nm@1mm writing field
Minimum feature size achieved: 8nm lines in HSQ resist in a 250um area
Tool name:
EBL - Raith EBPG 5200
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
Raith
Model:
EBPG 5200
Tool rate:
E
Price/hour:
Low: 2280 SEK
Medium: 3750 SEK
High: 5000 SEK

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