Picture of EBL - Raith EBPG 5200
Current status:
AVAILABLE
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High resolution electron beam lithography system.

Installed&accepted: 2016
Funded by: Wallenberg
Computer control: Red Hat Enterprise Linux
Control software: Raith BEAMS
Workpiece size: Chips >3-35mm, 2, 3, 4, 5, 6 and 8 inch wafers, 4, 5 and 6 inch masks
Materials allowed: Any vacuum compatible
Autoloader capacity: 10 cassettes
Acceleration voltage: 100kV
Electron source: Shottky TFE
Spotsize: 2nm - 150nm
Max scanning speed: 125MHz
Min beam step: 80pm
Field size: 1mm (max)
Stitching error 20nm@1mm writing field
Overlay error: 25nm@1mm writing field
Minimum feature size achieved: 8nm lines in HSQ resist in a 250um area

 

The FAQ can be found by going to the LIMS NFL wiki page by following the link "NFL process information wiki" after logging in to LIMS. Then navigate to:

"Maskless lithography" / "Electron beam lithography" / "Raith EBPG5200" / "EBPG5200_FAQ"

 

Tool name:
EBL - Raith EBPG 5200
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
Raith
Model:
EBPG 5200
Tool rate:
E
Price/hour:
Low: 2280 SEK
Medium: 3750 SEK
High: 5000 SEK

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Licensed Users

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