Tool #452 - Lesker #2 - is a general purpose, multi-material evaporator designed for up to 150 mm wafers. It has a 12-pocket e-gun, and this is normally loaded with Ti, Cr, Al, Ag, Au, Pd, Pt, Cu, Fe, Co, Al2O3 and SiO2 or Si (for current materials, please see the booking page and/or the logbook). The sample holder is tiltable +/-45 degrees and and is also equipped with indexable rotation. An ion gun for Ar ion sample precleaning is available, and there is also an oxygen inlet to oxidize the films after deposition.

The system is fully computer controlled, and the cryopump gives a base pressure <10E-7 Torr/mbar. Typical pumpdown time to the recommended evaporation pressure 1E10-6 Torr is 90 min.