CVD/PECVD system for growth of carbon nanotubes and nanofibers, and graphene.

PC controlled process and data logging.

Gases:
C₂H₂, NH₃, H₂, N₂, Ar, CH₄ (diluted, 5% CH₄ in Ar)

Electrical substrate heater:
RT – 850°C

Plasma generator:
Pulsed DC 1-100kHz, max 800V, 2.5A, 1kW

Substrate sizes:
small pieces up to 2 inch