1141.2 (RHEED System): The fourth generation of PLD (Pulsed Laser Deposition) equipment designed and built at Chalmers. It is equipped with load-lock for both targets and heater, separate evaporation chamber and in-situ high-pressure RHEED to control growth of complex oxide thin films. Base pressure is 2*10E-7 mbar, sample size normally 5*5 mm, but larger samples can be fitted. An XPS analytical chamber is docked to the system, and utilizes the same load-lock sample transfer system as the PLD chamber.