Picture of Furnace - Centrotherm #4-4 LPCVD - Polysilicon
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AVAILABLE
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Low pressure chemical vapour deposition of polysilicon or amorphous silicon from silane (SiH4).

 

Tool name:
Furnace - Centrotherm #4-4 LPCVD - Polysilicon
Area/room:
Processlab 1
Category:
Thermal processing
Manufacturer:
Centrotherm
Model:
LP-Polysilicon
Tool rate:
C
Price/hour:
Low: 580 SEK
Medium: 1000 SEK
High: 1250 SEK

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