Picture of Furnace - Centrotherm #4-2 LPCVD - TEOS
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Description

Low pressure chemical vapour deposition of silicon oxide from TEOS precursor.

 

Details
Tool name:
Furnace - Centrotherm #4-2 LPCVD - TEOS
Area/room:
Processlab 1
Category:
Thermal processing
Manufacturer:
Centrotherm
Model:
LP-TEOS
Tool rate:
C
Price/hour:
Low: 580 SEK
Medium: 1000 SEK
High: 1250 SEK
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