Wet bench dedicated for resist stripping. Lift-off should NOT be performed here (use wet bench 624)!

The bench is equipped with a remover bath, isopropanol bath and QDR bath (DI water). The remover bath is filled with Remover mr-Rem 400. It has an ultrasonic function and can either be heated (fixed set point at 55 °C) or work can be done at RT. Isopropanol bath can only be used at RT, the heater is not connected.

The bench also has a Rinse and Dryer for 3" wafers.

An automatic fire extinguisher is installed above the chemical baths.