Wet bench for acid/base work.
A Rinse and Dryer for 2" is installed. Use only dedicated 2" wafer carriers in the Rinse and Dryer. STD1 program is set up with: 60 sec rinsing until 15 MOhm; 180 sec spin at 2000 rpm; 230 sec spin dry at 600 rpm. Total time is >=370 sec.
The wet bench is also equipped with a simple single wafer spin dryer.