Picture of Wet Bench - Acid & Base
Current status:
AVAILABLE
Book | Log
Show/Collapse all

You must be logged in to view files.

Wet bench for acid/base work.

A Rinse and Dryer for 2" is installed. Use only dedicated 2" wafer carriers in the Rinse and Dryer. STD1 program is set up with: 60 sec rinsing until 15 MOhm; 180 sec spin at 2000 rpm; 230 sec spin dry at 600 rpm. Total time is >=370 sec.

The wet bench is also equipped with a simple single wafer spin dryer.

Tool name:
Wet Bench - Acid & Base
Area/room:
Processlab 1
Category:
Wet processing
Manufacturer:
Stangl
Model:
Wet bench
Tool rate:
A
Price/hour:
Low: 125 SEK
Medium: 250 SEK
High: 370 SEK

Instructors

Licensed Users

You must be logged in to view tool modes.