Picture of Spinner - BLE & HMDS hotplate - Microwave line
Current status:
AVAILABLE
Book | Log
Show/Collapse all

You must be logged in to view files.

Wet bench with one spinner module and one HMDS hotplate. The spinner is intended for deposistion of photo resist and ebeam resist. It has chucks for small pieces and for wafers up to 150 mm diameter. The HMDS hotplate is intended for application of a thin layer of primer (HMDS) on wafers and other samples before coating with photo-resist or ebeam-resist. The HMDS hotplate process will also promote resist adhesion by dehydration of the surface by a short vacuum bake. Usage of the wet bench is reserved for the microwave and photonics process line

Tool name:
Spinner - BLE & HMDS hotplate - Microwave line
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
PM-plast
Model:
Wet bench
Max booking time, day:
8 hours
Max booking time, night:
16 hours
No. of future bookings:
5

Instructors

Licensed Users

Microwave and Photonics process line
You must be logged in to view tool modes.