Picture of Wet Bench - Solvent - Mask cleaning
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AVAILABLE
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Work station for wet etching of ITO and glass substrate processing.

This bench is equiped with quick dump rinse bath, ultrasonic bath with remover, warm ITO etching bath and rinser and dryer adopted for 3"x3" glass substrates. The ultrasonic bath is loaded with Remover mr-Rem 400 and the temperature is set to 50°C. This bath is dedicated for mask cleaning.

Tool name:
Wet Bench - Solvent - Mask cleaning
Area/room:
Processlab 1
Category:
Wet processing
Manufacturer:
Stangl
Model:
505
Max booking time, day:
8 hours
Max booking time, night:
8 hours
No. of future bookings:
5

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