Picture of Evaporator - Edwards
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Tool #425 – Edwards 306 Evaporator This equipment is designed for high precision angle evaporation. It is equipped with a 4-position resistive evaporation source, and the fully automatic turbomolecular pumping system gives a base pressure of <5*10E-7 mbar. Sample size is maximum 50 mm with the tilt stage, but without tilt it is possible to fit up to 6” (152,4 mm) wafers. An oxygen gas inlet allows for in-situ oxidation of Al films. Materials permitted are Al, Au, Ag, Cr, Cu, Ge and Ti

Tool name:
Evaporator - Edwards
Area/room:
Processlab 1
Category:
Thin film deposition
Manufacturer:
Edwards
Model:
Auto 306
Max booking time, day:
9 hours
Max booking time, night:
9 hours
No. of future bookings:
5

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