Picture of Dry etch ICP - STS - Deep Silicon etch
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Plasma etcher for deep silicon etching. For etching of 6" wafers, smaller wafers need to be mounted on 6" carrier wafers. Gases: SF6, C4F8, O2

Funded by: Knut and Alice Wallenbergs foundation.

Tool name:
Dry etch ICP - STS - Deep Silicon etch
Area/room:
Processlab 1
Category:
Dry etching
Manufacturer:
STS
Model:
STS ICP
Tool rate:
D
Price/hour:
Low: 910 SEK
Medium: 1600 SEK
High: 2000 SEK

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