Picture of Dry etch ICP - STS - Deep Silicon etch
Current status:
DOWN
Book | Log
Show/Collapse all

You must be logged in to view files.

Plasma etcher for deep silicon etching. For etching of 6" wafers, smaller wafers need to be mounted on 6" carrier wafers. Gases: SF6, C4F8, O2

Funded by: Knut and Alice Wallenbergs foundation.

Tool name:
Dry etch ICP - STS - Deep Silicon etch
Area/room:
Processlab 1
Category:
Dry etching
Manufacturer:
STS
Model:
STS ICP
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:
2

Instructors

Licensed Users

You must be logged in to view tool modes.