Picture of Spinner - Suss LabSpin6 & High temp hotplates
Current status:
AVAILABLE
Book | Log
Show/Collapse all

You must be logged in to view files.

Placement: Process lab 1, nanolithography.

Workspace with a resist spinner, two hotplates, and one oven with fan air circulation. The hotplates here are used for high temperature polymers, such as PMMA, Copolymer, ZEP, and LOR. Do NOT use regular photoresist here! SU8 and BCB are not allowed to be used on these hotplates, please use tool #209 instead.

Tool name:
Spinner - Suss LabSpin6 & High temp hotplates
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
Suss Microtech
Model:
-
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:
15

Instructors

Licensed Users

You must be logged in to view tool modes.