Placement: Process lab 1, nanolithography.
Workspace with a resist spinner, two hotplates, and one oven with fan air circulation. The hotplates here are used for high temperature polymers, such as PMMA, Copolymer, ZEP, and LOR. Do NOT use regular photoresist here! SU8 and BCB are not allowed to be used on these hotplates, please use tool #209 instead.