Picture of Wet Bench - Solvent - Development work & Hot Plate
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Workplace for manual development of photoresist patterns.

Equipment: Water tap, sink, QDR, water spraygun, N2 blowgun, hotplate
QDR workpiece size: Up to 4-inch wafers
Hotplate workpiece size: Up to 6-inch wafers
Materials allowed: Any

 

Tool name:
Wet Bench - Solvent - Development work & Hot Plate
Area/room:
Processlab 1
Category:
Wet processing
Manufacturer:
Stangl + BLE
Model:
Wetbench
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:
5

Instructors

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