Picture of Dry etch Stripper - TePla
Current status:
AVAILABLE
Book | Log
Show/Collapse all

You must be logged in to view files.

Microwave plasma system intended for strip and descum of photo resist and ebeam resist. Max power is 1000W. Available process gases are O2 and N2.

Funded by: Knut and Alice Wallenbergs foundation.

Tool name:
Dry etch Stripper - TePla
Area/room:
Processlab 1
Category:
Dry etching
Manufacturer:
TePla AG
Model:
300PC
Tool rate:
C
Price/hour:
Low: 580 SEK
Medium: 1000 SEK
High: 1250 SEK

Instructors

Licensed Users

You must be logged in to view tool modes.