Picture of Dry etch Stripper - TePla
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Microwave plasma system intended for strip and descum of photo resist and ebeam resist. Max power is 1000W. Available process gases are O2 and N2.

Funded by: Knut and Alice Wallenbergs foundation.

Tool name:
Dry etch Stripper - TePla
Area/room:
Processlab 1
Category:
Dry etching
Manufacturer:
TePla AG
Model:
300PC
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:
5

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