Picture of Mask aligner - Suss MJB3 DUV
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2013-09-25. Mask aligner for DUV photolithography - wavelenght: 200-300nm - maximum mask size: 4 inch - maximum material size: 3 inch. Intensity: 3 mW/sqcm @ 240nm / 0.9 mW/sqcm @ 220nm - placement: Process lab 1, nanoarea. No filtering of the emission wavelength, that means we have broadband emission. The total intensity is still unknown, but should be in the region of 5-6mW or so.

/John

Tool name:
Mask aligner - Suss MJB3 DUV
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
Karl Suss
Model:
MJB3 DUV
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:
5

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