Picture of EBL - JEOL JBX 9300FS
Current status:
AVAILABLE
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High resolution electron beam lithography system.

Installed&accepted: 2002
Funded by: Wallenberg
Computer control: Compaq Tru64 unix
Control software: JEOL ebxmenu XWin
Workpiece size: Chips >5-35mm, 2, 3, 4, 6 and 8 inch wafers, 3, 4 and 6 inch square
Materials allowed: Any vacuum compatible
Autoloader capacity: 2 cassettes
Acceleration voltage: 50kV or 100kV
Electron source: Shottky TFE
Spotsize: 4nm - 100nm
Max scanning speed: 50MHz
Min beam step: 1nm@100kV, 2nm@50kV
Field size: 500um@100kV, 1000um@50kV
Stitching error 20nm@100kV, 25nm@50kV
Overlay error: 25nm@100kV, 20nm@50kV
Minimum feature size achieved: 10nm lines in HSQ resist
Tool name:
EBL - JEOL JBX 9300FS
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
JEOL Ltd.
Model:
JBX9300FS
Max booking time, day:
3 hours
Max booking time, night:
12 hours
No. of future bookings:
3

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