Picture of Mask aligner - Suss MJB3 UV 400 #1
Current status:
AVAILABLE
Book | Log
Show/Collapse all

You must be logged in to view files.

Mask aligner for UV photolithography - wavelenght: 400nm - mask size: 4 inch - material size: 3 inch.

UV-Intensity: 15 mW/cm2 , broadband emission wavelengths constituting 365mn (i-line) , 405nm (h-line), and 436nm (g-line).

Placement: Process lab 1, III/V area

Funded by: Knut and Alice Wallenbergs foundation.

Tool name:
Mask aligner - Suss MJB3 UV 400 #1
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
Karl Suss
Model:
MJB3
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:
5

Instructors

Licensed Users

Microwave and Photonics process line
You must be logged in to view tool modes.