Picture of EBL - Raith EBPG 5200
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High resolution electron beam lithography system.

Installed&accepted: 2016
Funded by: Wallenberg
Computer control: Red Hat Enterprise Linux
Control software: Raith BEAMS
Workpiece size: Chips >3-35mm, 2, 3, 4, 5, 6 and 8 inch wafers, 4, 5 and 6 inch masks
Materials allowed: Any vacuum compatible
Autoloader capacity: 10 cassettes
Acceleration voltage: 100kV
Electron source: Shottky TFE
Spotsize: 2nm - 150nm
Max scanning speed: 125MHz
Min beam step: 80pm
Field size: 1mm
Stitching error 20nm@100kV
Overlay error: 25nm@100kV, 20nm@50kV in special configuration 5nm@100kV
Minimum feature size achieved: 8nm lines in HSQ resist in a 250um area
Tool name:
EBL - Raith EBPG 5200
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
Raith
Model:
EBPG 5200
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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