The BM system is intended for the deposition of high quality graphene onto substrates up to 2 inch in diameter using CVD or PECVD technology.

The system is equipped with a bottom heater, onto which the substrate is placed, and a top heater with a plasma showerhead, where the gases are introduced and pre-heated. 

Low temperature mode: up to appr. 1000 C, substrate size up to 2 inch

High temperature mode: up to 1700 C, substrate size up to 10x10 mm (requires a special heater)

Available process gases: CH4, 5% CH4 in Ar, H2, Ar, N2, NH3, O2.

(Vapor draw liquid box installed, but not configured.)