The Lesker Nano 36 is a thermal evaporator dedicated to creating Cr thin films. It was installed to provide reflective and conductive layers to support our electron beam and laser lithography. Film thicknesses up to 30nm can be deposited in one run using six predefined and one variable recipes. Substrates from small piece parts up to 6 inch wafers can be accommodated. Although no load-lock is available the system pumping time is approximately 10min.