Canon FPA3000-i4 i-line photolithography stepper

*** MAKE SURE WAFER BACKSIDE IS CLEAN BEFORE LOADING INTO STEPPER ***

*** MAKE SURE RETICLE IS CLEAN  BEFORE LOADING INTO STEPPER ***

Can expose: 6". 4"/3"/small chips can be loaded using adapters

Projection Magnification:  1/5 X
Exposure Light:  365nm
Numerical Aperture:  ~0.63
Maximum Field Size:  ~22x22mm
Throughput: ~60 wafers per hour
Masks: only 5" Quartz masks with certain layout

Standard Illumination:
Exposure Light:  i-Line
Light Source:  2.0KW Hg lamp
Intensity:  >6500W/m2
Uniformity:  <1.2%
Masking Blade:  Blades Independent (0.4X0.4mm~26X26mm on wafer)

Printing Performance:
Resolution:  <~0.5µm
Depth of Focus:  >~1.0µm
Image Field Deviation:  <0.5µm
Distortion:  <±0.05µm