Picture of CVD - MTI - Graphene
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Description

OTF-1200X-4-II-C4OV-SL is a slidable dual heating zone CVD system designed for preparing
graphene (as well as nanotube and various CVD film, especially for preparing flexible electrode on metallic foil
on new generation energy research). Fast heating and cooling can be achieved by sliding the furnace.

Intended Use

The OTF-1200X-4-II-C4OV-SL CVD tube furnace system consists of a OTF-1200X tube furnace, a vacuum
station and a 4 channels gas mix/delivery station.

The OTF-1200X tube furnace is using a high quality fused quartz tube and Fe-Cr-Al heating element to
fulfill the general purpose of high temperature heating treatment. For optimum heating element life, please
follow the temperature rule below:

RT~1000°C for continuous use
1000~1100°C (max.) for intermittent use (less than 60 minutes heating time)

Tool name:
CVD - MTI - Graphene
Area/room:
Processlab 2
Category:
Thin film deposition
Manufacturer:
MTI Corporation
Model:
OTF-1200X-4-II-C4OV-SL
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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