Picture of Software - GenISys LAB
Current status:
AVAILABLE
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LAB is a lithography simulation tool which can simulate exposure and development, both for photo- and electron beam lithography. It requires information about the resist sensitivity and contrast, as well as the developer properties.

Tool name:
Software - GenISys LAB
Area/room:
[Not defined]
Category:
Lithography
Manufacturer:
GenIsys
Model:
LAB simulation package
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

Instructors

Licensed Users

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