Currently the Exposure System uses a DUV 220nm mirror. The DUV 220nm mirror is dielectric type and primarily reflect 220nm-260nm radiation. The intensity is set to 10mW/cm2.
Tool 261 is a flood exposure system for short (Deep UV) wavelengths. It can be set up either for 240-275nm or 220-260nm radiation, by exchanging the final mirror set.
Processes include curing of polymers, conformal mask lithography including mix-and-match DUV-EBL lithography.