Picture of Flood exposure - Bachur & Associates - DUV
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Currently the Exposure System uses a DUV 220nm mirror. The DUV 220nm mirror is dielectric type and primarily reflect 220nm-260nm radiation. The intensity is set to 10mW/cm2.

Tool 261 is a flood exposure system for short (Deep UV) wavelengths. It can be set up either for 240-275nm or 220-260nm radiation, by exchanging the final mirror set.

Processes include curing of polymers, conformal mask lithography including mix-and-match DUV-EBL lithography.

/John

 

Tool name:
Flood exposure - Bachur & Associates - DUV
Area/room:
Processlab 1
Category:
Lithography
Manufacturer:
Bachur & Associates
Model:
LS 150X-5C2 500W
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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