Picture of Dry etch RIE - Plasma-Therm - Oxygen
Current status:
AVAILABLE
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Plasma system for O2 stripping and cleaning. Available gases: O2

Tool name:
Dry etch RIE - Plasma-Therm - Oxygen
Area/room:
Processlab 1
Category:
Dry etching
Manufacturer:
Plasma Therm
Model:
BatchTop RIE
Max booking time, day:
2 hours
Max booking time, night:
4 hours
No. of future bookings:
4

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