Picture of Evaporator - Lesker PVD 225 #1
Current status:
AVAILABLE
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E-beam thin film evaporator with 12 pockets for sources.
Load lock:  Yes
Ion beam pre clean:  No
Base pressure:  3x10-8 Torr
Max wafer size:  ø160 mm
Currently available sources:  Ti, Al, Cr, Au, Ge, Pd, Ni, Pt, Ag, Cu, V
Pump time to below 5x10-7 Torr:  10 min

Tool name:
Evaporator - Lesker PVD 225 #1
Area/room:
Processlab 1
Category:
Thin film deposition
Manufacturer:
Lesker
Model:
PVD 225
Max booking time, day:
3 hours
Max booking time, night:
4 hours
No. of future bookings:
3

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