E-beam thin film evaporator with 12 pockets for sources.
Load lock: Yes
Ion beam pre clean: No
Base pressure: 3x10-8 Torr
Max wafer size: ø160 mm
Currently available sources: Ti, Al, Cr, Au, Ge, Pd, Ni, Pt, Ag, Cu, V, Ta
Pump time to below 5x10-7 Torr: 10 min