Picture of Dry etch ICP - STS
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AVAILABLE
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Dry etching tool for via hole etching of SiC and InP.

Gases:  Ar  O2  N2  He  SF6  HBr  Cl2

Funded by: Knut and Alice Wallenbergs foundation.

Tool name:
Dry etch ICP - STS
Area/room:
Processlab 1
Category:
Dry etching
Manufacturer:
STS
Model:
ICP MPX
Max booking time, day:
12 hours
Max booking time, night:
12 hours
No. of future bookings:
4

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