Picture of CVD - Aixtron - CNT
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CVD/PECVD system for growth of carbon nanotubes and nanofibers, and graphene.

PC controlled process and data logging.

Gases:
C2H2, NH3, H2, N2, Ar, CH4 (diluted, 5% CH4 in Ar)

Electrical substrate heater:
RT – 850°C

Plasma generator:
Pulsed DC 1-100kHz, max 800V, 2.5A, 1kW

Substrate sizes:
small pieces up to 2 inch

Tool name:
CVD - Aixtron - CNT
Area/room:
Processlab 2
Category:
Thin film deposition
Manufacturer:
Aixtron
Model:
Black Magic 2-inch
Max booking time, day:
8 hours
Max booking time, night:
8 hours
No. of future bookings:
6

Instructors

Licensed Users

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