Picture of Sputter - DCA Cluster - Metals
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Near-UHV sputter system with 3*3" magnetron sources for deposition of high quality Nb, Al and Au thin films. Max sample size 2". Equipped with a Kaufmann type ion gun for sample cleaning. Connected to a cluster of 3 deposition modules with a common transfer and loading system.

Funded by: Knut and Alice Wallenbergs foundation.

Tool name:
Sputter - DCA Cluster - Metals
Area/room:
Processlab 2
Category:
Thin film deposition
Manufacturer:
DCA
Model:
MTD 450
Max booking time, day:
24 hours
Max booking time, night:
24 hours
No. of future bookings:
5

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