Picture of PLD - RHEED System
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1141.2 (RHEED System): The fourth generation of PLD (Pulsed Laser Deposition) equipment designed and built at Chalmers. It is equipped with load-lock for both targets and heater, separate evaporation chamber and in-situ high-pressure RHEED to control growth of complex oxide thin films. Base pressure is 2*10E-7 mbar, sample size normally 5*5 mm, but larger samples can be fitted.

Tool name:
PLD - RHEED System
Area/room:
Processlab 2
Category:
Thin film deposition
Manufacturer:
Chalmers/TSST
Model:
High pressure RHEED
Max booking time, day:
12 hours
Max booking time, night:
12 hours
No. of future bookings:
4

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