Picture of PLD - RHEED System
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1141.2 (RHEED System): The fourth generation of PLD (Pulsed Laser Deposition) equipment designed and built at Chalmers. It is equipped with load-lock for both targets and heater, separate evaporation chamber and in-situ high-pressure RHEED to control growth of complex oxide thin films. Base pressure is 2*10E-7 mbar, sample size normally 5*5 mm, but larger samples can be fitted. An XPS analytical chamber is docked to the system, and utilizes the same load-lock sample transfer system as the PLD chamber.

Tool name:
PLD - RHEED System
Area/room:
Processlab 2
Category:
Thin film deposition
Manufacturer:
Chalmers/TSST
Model:
High pressure RHEED
Tool rate:
C
Price/hour:
Low: 580 SEK
Medium: 1000 SEK
High: 1250 SEK

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