Picture of PLD - Twin System
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1140.2 (Twin): PLD (Pulsed Laser Deposition) equipment designed and built at Chalmers. It is equipped with a computer controlled target revolver for up to four targets and RF ion gun for sample pre-treatment/etching or film growth enhancement. It is dedicated for very high quality high-Tc materials and multilayers. The base pressure of the turbo pumped system is <5*10E-7 mbar, and the sample size is normally 5*5 mm.

Tool name:
PLD - Twin System
Area/room:
Processlab 2
Category:
Thin film deposition
Manufacturer:
Chalmers/Staffan Pehrson
Model:
Generation II
Max booking time, day:
24 hours
Max booking time, night:
24 hours
No. of future bookings:
5

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