1140.2 (Twin): PLD (Pulsed Laser Deposition) equipment designed and built at Chalmers. It is equipped with a computer controlled target revolver for up to four targets and RF ion gun for sample pre-treatment/etching or film growth enhancement. It is dedicated for very high quality high-Tc materials and multilayers. The base pressure of the turbo pumped system is <5*10E-7 mbar, and the sample size is normally 5*5 mm.