Wet bench dedicated for resist stripping. Lift-off should NOT be performed here (use wet bench 624)!
The bench is equipped with a remover bath, acetone bath and QDR bath (DI water). The remover bath is filled with Remover mr-Rem 400. It has an ultrasonic function and can either be heated (fixed set point at 55 °C) or work can be done at RT. Acetone bath can only be used at RT, the heater is not connected.
The bench also has a Rinse and Dryer for 3" wafers.
An automatic fire extinguisher is installed above the chemical baths.