Picture of Wet Bench - Acid & Base
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AVAILABLE
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Wet bench for acid/base work.

A Rinse and Dryer for 2" is installed. Use only dedicated 2" wafer carriers in the Rinse and Dryer. STD1 program is set up with: 60 sec rinsing until 15 MOhm; 180 sec spin at 2000 rpm; 230 sec spin dry at 600 rpm. Total time is >=370 sec.

The wet bench is also equipped with a simple single wafer spin dryer.

Tool name:
Wet Bench - Acid & Base
Area/room:
Processlab 1
Category:
Wet processing
Manufacturer:
Stangl
Model:
1940-40
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:
5

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