Picture of Wet Bench - Acid & Base - Al-etch bath
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AVAILABLE
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Wet bench dedicated for aluminium etches. Equipped with one bath with aluminium etch solution. Typical Al etch rate is ca 200 nm/min.

Only wafer carriers with a green mark are allowed here. The bench is also equipped with a Rinse and Dryer, which is set up för 4" wafers.

Make sure you use correct PPE!

Tool name:
Wet Bench - Acid & Base - Al-etch bath
Area/room:
Processlab 1
Category:
Wet processing
Manufacturer:
Stangl
Model:
652
Max booking time, day:
4 hours
Max booking time, night:
4 hours
No. of future bookings:
5

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